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carrier mobility中文是什么意思

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用"carrier mobility"造句"carrier mobility"怎么读"carrier mobility" in a sentence

中文翻译手机手机版

  • 单位载流子平均漂移速度
  • 载劣迁移率
  • 载体迁移率

例句与用法

  • We represent a temperature model of surface carrier mobility of short channel most after thinking about kinds of dispersion effect
    在考虑了各种散射效应对迁移率的影响后,提出了短沟道most表面载流子迁移率的温度模型。
  • It was found that , the as grown crystal of mnxcd1 - xin2te4 is p type semiconductor , both the charge density and the resistivity increase with x value , while the carrier mobility decreases with x
    晶体的电学性能,发现生长态的mncd晶体均为p型半导体。随着组分x值的增大,载流于的浓度np减小,迁移率p 。
  • The carrier mobility of the s doped n - type diamond had the same order as the s doped 1 b diamond and the changes of the character of diamond along with the changes of intensity of s doped in diamond were investigated
    其中,采用cvd技术制备的以硫为施主的n型金刚石薄膜的迁移率与b单晶金刚石硫掺杂的迁移率达到了相同的量级。
  • The hetrojunction device fabricated with sige material has shown great advantages over bulk sample in many aspects : higher carrier mobility , larger transconductance , stronger drive capability and hence faster circuit speed
    与体si器件相比,采用sige材料的异质结器件已经在许多方面显示出了强大的优势:譬如更大的载流子迁移率,更大的跨导,更强的电流驱动能力以及更快的电路速度等等。
  • It is pointed that inversion - layer mobility is different from field - effect mobility for sic mosfet . and a relationship has been established between the ratio of the experimentally - determined field - effect mobility to the actual inversion - layer carrier mobility and interface states
    明确指出碳化硅器件的反型层迁移率和实验测定的场效应迁移率不能等同,并给出了以上二者的比值与界面态密度的定量关系。
  • The recent development of organic electron transport materials are reviewed as well . several technologies for charge carrier mobility measurement are summarized and compared , and a series of basic principles for designing high - performance organic electron transport materials are suggested as well
    本章还重点综述了有机电子传输材料研究的最新进展,总结和比较了有机材料载流子迁移率的测试方法,并提出了设计高性能有机电子传输材料的若干原则。
  • In this paper , the subband structure in the inversion layer is constructed by solving the self - consistent schr ? dinger equation , thus the carrier effective mass and scattering rate can be obtained . furthermore , taking account for the carrier density in each subband , we establish carrier mobility model in strained - si mosfet
    本文通过求解自洽薛定谔方程,确定了应变硅mosfet反型层的子能带结构,在此基础上经进一步计算得到子能带内载流子的有效质量和散射几率,综合考虑各子能带上的载流子的浓度分布,建立了应变硅mosfet载流子迁移率的解析模型。
  • Secondly , we measured the electrical properties of the ion - implanted samples by hall method ( square carrier concentration , square resistance and carrier mobility ) . after comparing and analyzing , we can know that the electrical properties were affected by the difference of mn dose , the implantation of c and the annealing temperature
    其次,利用霍尔测试方法测量了每种离子注入样品的电性质(方块载流子浓度、方块电阻及载流子迁移率) ,通过比较分析了解到mn元素注入剂量、 c元素的注入以及退火温度的不同,都会对样品的电性质产生影响。
  • Strained - soi mosfet , which appears recently , takes both the advantages of soi ( silicon on insulator ) and sige ( silicon germanium ) . it has shown advantages over bulk sample in enhanced carriers mobility , as well as higher transconductance , stronger drive capability and reduced parasitic capacitances . these properties make it a promising candidate for improving the performance of microelectronics devices
    Strained - soimosfet是最近几年才出现的新型器件,它将soi材料和sige材料结合在一起,与传统体硅器件相比,表现出载流子迁移率高、电流驱动能力强、跨导大、寄生效应小等优势,特别适用于高性能、高速度、低功耗超大规模集成电路。
  • Experimental results revealed that the carrier mobility increased with increasing of the annealing temperature , in the range of the annealing temperature from 650 ? to 850 ? , which implied that the crystal lattice structure was damaged by ion implantation and restored after annealing . furthermore , the square carrier concentration decreased , and the square resistance of the samples implanted by mn + and c increased with the raising of annealing temperature . these results indicated that the second phase such as mnga , mnas ferromagnets was formed by more mn + ions with increasing of the ( gaas ) annealing temperature , so the mn + ions which can provide carriers decreased
    由实验结果可以知道在退火温度为650 850范围内,样品的载流子迁移率随着退火温度的提高呈上升趋势,说明杂质元素的注入对样品造成晶格损伤,但退火对这些损伤具有修复作用;此外,随着退火温度的上升,样品的方块载流子浓度不断下降,加c样品的方块电阻不断上升,这都是因为随着退火温度的提高,掺入的mn ~ +离子不再提供载流子,而是形成了mnga 、 mnas等磁性第二相。
  • 更多例句:  1  2
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